Overview
Atomic-level thickness control, low-temperature deposition (RT–400°C), perfect conformality on high aspect ratio structures. Material systems include oxides (Al₂O₃, HfO₂, SiO₂, etc.), nitrides (TiN, AlN), and metals (Pt, Ru).
Key Features
- Atomic-level thickness control
- RT–400°C deposition
- Perfect conformality
- Thermal & PE-ALD modes
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