Components
RF Power Supplies — 13.56MHz
Reliable RF Power for Plasma Processing
Overview
Wide range of RF power supplies operating at 13.56MHz, from 300W to 3,000W. Designed for stable plasma generation in sputtering, etching, and PECVD processes.
Key Features
- 13.56MHz frequency
- 300W–3,000W range
- Auto-matching available
- Low reflected power
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