Products
Products
PVD Sputtering Systems
Multi-source magnetron sputtering for metals, dielectrics, and compound films — R&D to production scale.
View DetailsDLC & TAC Coating Systems
Diamond-Like Carbon and Tetrahedral Amorphous Carbon — extreme hardness, low friction, extended component life.
View DetailsALD Systems
Atomic Layer Deposition — nanometer-precision films with perfect conformality. Thermal & plasma-enhanced.
View DetailsMagnetron Cathodes
Round, planar, and rotary cathodes — 2" to 12" — optimized for every deposition geometry and throughput need.
View DetailsRF Power Supplies — 13.56MHz
RF generators from 300W to 3,000W at 13.56MHz for plasma processes and thin-film deposition.
View DetailsMicrowave Generators — 2.45GHz
Solid-state and magnetron-based microwave generators from 300W to 6kW for advanced plasma applications.
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OWLS‑1800
The OWLS-1800 is a dedicated metal-mode sputtering system for semiconductor optics. It supports wafers up to 12 inches, featuring dual-size simultaneous coating and low-temperature coating. It delivers high-precision thin-film deposition for semiconductor and optical applications.
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